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| TI Ref No : | 516896268 |
|---|---|
| Description : | Multitarget Uhv Sputtering System Multi Target Uhv Sputtering System System Should Consist Of Deposition Chamber And Load Lock Chamber With Ultra High Vacuum. Sputtering Chamber Should Be Provided With 6 Sputter Cathodes Of Dc. Load Lock Chamber Wit |
| Date : | 2025-04-15 |
| Deadline : | 2025-05-17 |
| Document Type : | Tenders |
